OPTICAL COMPONENT CATEGORY
Reticles & Calibration Targets
Reticles and calibration targets provide known patterns for aiming, dimensional measurement, image-quality evaluation and camera calibration. The catalog includes one-dimensional and two-dimensional measuring reticles, concentric-ring and aiming patterns, USAF 1951 and related resolution targets, plus dot-grid, checkerboard and stereo calibration plates for machine-vision and multi-camera systems. The pattern should match the intended analysis method and illumination geometry.
Choose the active pattern size and pitch so the complete feature set fits the field of view while individual lines or dots remain adequately sampled by the detector. Then verify substrate material, overall dimensions, thickness, pattern material, line-width or pitch tolerance, surface quality and flatness. Transmitted-light and reflected-light setups may require different pattern contrast or coating arrangements. Model pages provide the exact drawing and accuracy data for integration and calibration planning.
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Calibration Targets
3 product familiesCalibration targets provide known geometric patterns for camera calibration, machine vision and dimensional verification.
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Resolution Targets
2 product familiesResolution targets provide standardized line patterns for evaluating imaging-system contrast and resolving power.
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Reticles
5 product familiesOptical reticles place measurement, aiming or reference patterns in an imaging plane.
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Reticles & Calibration Targets
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SELECTION QUESTIONS
Reticles & Calibration Targets FAQ
Technical answers to the questions that most often affect model selection.
What is the difference between a reticle and a calibration target?
A reticle provides an aiming, measuring or reference pattern in an imaging plane. A calibration target provides known geometry for camera calibration, distortion measurement or dimensional verification. Resolution targets specifically assess contrast and resolving power.
How should pattern type and pitch be selected?
Choose a pattern that matches the measurement algorithm and field of view, then select line width, spacing or pitch that the imaging system can resolve with adequate pixel sampling. The active pattern area must fit within the usable field.
Which substrate and accuracy specifications are important?
Verify substrate material, thickness, pattern material, dimensional accuracy, line-width tolerance, surface quality and flatness. Transmitted and reflected illumination require different pattern contrast and coating arrangements.
Need a different diameter, tolerance or coating?
Send your material, wavelength, dimensions and quantity for review.
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